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Micropore x-ray optics using anisotropic wet etching of (110) silicon wafers

Yuichiro Ezoe, Masaki Koshiishi, Makoto Mita, Kazuhisa Mitsuda, Akio Hoshino, Yoshitaka Ishisaki, Zhen Yang, Takayuki Takano, and Ryutaro Maeda

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Abstract

To develop x-ray mirrors for micropore optics, smooth silicon (111) sidewalls obtained after anisotropic wet etching of a silicon (110) wafer were studied. A sample device with 19 μm wide (111) sidewalls was fabricated using a 220 μm thick silicon (110) wafer and potassium hydroxide solution. For what we believe to be the first time, x-ray reflection on the (111) sidewalls was detected in the angular response measurement. Compared to ray-tracing simulations, the surface roughness of the sidewalls was estimated to be 3–5 nm, which is consistent with the atomic force microscope and the surface profiler measurements.

© 2006 Optical Society of America

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