Design, fabrication, and analysis of chirped multilayer mirrors for reflection of extreme-ultraviolet attosecond pulses
Applied Optics, Vol. 45, Issue 17, pp. 4147-4156 (2006)
http://dx.doi.org/10.1364/AO.45.004147
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Abstract
Chirped Mo∕Si multilayer coatings have been designed, fabricated, and characterized for use in extreme-ultraviolet attosecond experiments. By numerically simulating the reflection of the attosecond pulse from a multilayer mirror during the optimization procedure based on a genetic algorithm, we obtain optimized layer designs. We show that normal incidence chirped multilayer mirrors capable of reflecting pulses of approximately 100 attoseconds (as) duration can be designed by enhancing the reflectivity bandwidth and optimizing the phase-shift behavior. The chirped multilayer coatings have been fabricated by electron-beam evaporation in an ultrahigh vacuum in combination with ion-beam polishing of the interfaces and in situ reflectivity measurement for layer thickness control. To analyze the aperiodic layer structure by hard-x-ray reflectometry, we have developed an automatic fitting procedure that allows us to determine the individual layer thicknesses with an error of less than
© 2006 Optical Society of America
OCIS Codes
(310.1620) Thin films : Interference coatings
(320.0320) Ultrafast optics : Ultrafast optics
(340.7470) X-ray optics : X-ray mirrors
History
Original Manuscript: September 16, 2005
Manuscript Accepted: November 1, 2005
Virtual Issues
Vol. 1, Iss. 7 Virtual Journal for Biomedical Optics
Citation
A. Wonisch, U. Neuhäusler, N. M. Kabachnik, T. Uphues, M. Uiberacker, V. Yakovlev, F. Krausz, M. Drescher, U. Kleineberg, and U. Heinzmann, "Design, fabrication, and analysis of chirped multilayer mirrors for reflection of extreme-ultraviolet attosecond pulses," Appl. Opt. 45, 4147-4156 (2006)
http://www.opticsinfobase.org/vjbo/abstract.cfm?URI=ao-45-17-4147
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