Abstract
Coherent radiation from undulator beamlines has been used to directly measure the real and imaginary parts of the index of refraction of several materials at both extreme-ultraviolet and soft-x-ray wavelengths. Using the XOR interferometer, we measure the refractive indices of silicon and ruthenium, essential materials for extreme-ultraviolet lithography. Both materials are tested at wavelength and across silicon's and absorption edges. We further extend this direct phase measurement method into the soft-x-ray region, where measurements of chromium and vanadium are performed around their L 3 absorption edges at 574.1 and , respectively. These are the first direct measurements, to our knowledge, of the real part of the index of refraction made in the soft-x-ray region.
© 2006 Optical Society of America
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