Narrowband SiC∕Tb and Si∕Tb multilayers are fabricated with as much as a 23\% normal-incidence reflectance near a 60\text{\hspace{0.17em} nm} wavelength and spectral bandpass (FWHM) values of 9.4 and 6.5\text{\hspace{0.17em} nm} , respectively. The structural properties of the films are investigated using extreme ultraviolet and x-ray reflectometry and transmission electron microscopy. Thermal stability is investigated in films annealed to as high as 300°\text{C} . Because of their superior thermal stability, relatively high reflectance, and narrower spectral bandpass, Si∕Tb multilayers are identified as optimal candidates for solar physics imaging applications, where the peak response can be tuned to important emission lines such as O v near 63.0\text{\hspace{0.17em} nm} and Mg x near 61.0\text{\hspace{0.17em} nm} . We describe our experimental procedures and results, discuss the implications of our findings, and outline prospects for improved performance.