Abstract

In this work, an improved phase stitching algorithm is proposed in digital holography (DH) based on a deduced phase errors model and a global optimization algorithm. In addition, to correct the relative rotation error between the coordinate systems of a CCD and $xy$-motion stages, we presented a simple and reliable image-based correction method. The experimental results obtained from our proposed method are compared with those calculated from the existing phase stitching method to verify the performance of the presented method. It is shown that our new proposed methods are robust and valid for measurement of a large microstructure element. As far as we know, the improved phase stitching algorithm and image-base correction method have not been discussed in DH, as we presented in this paper.

© 2015 Optical Society of America

Measurement and compensation of a stitching error in a DMD-based step-stitching photolithography system

Shuang Zhou, Zifeng Lu, Qixiang Yuan, Guangkun Wu, Chunxia Liu, and Hua Liu
Appl. Opt. 60(29) 9074-9081 (2021)

Phase shift steps extraction and phase shift error correction in partially coherent illuminated phase-shifting digital holography

Tianlong Man, Yuhong Wan, and Dayong Wang
Appl. Opt. 54(7) 1839-1843 (2015)

Stitching sub-aperture in digital holography based on machine learning

Feng Pan, Bin Dong, Wen Xiao, and Pietro Ferraro
Opt. Express 28(5) 6537-6551 (2020)

Detection and correction of wavefront errors caused by slight reference tilt in two-step phase-shifting digital holography

Xianfeng Xu, Luzhong Cai, Fei Gao, Yulei Jia, and Hui Zhang
Appl. Opt. 54(32) 9591-9596 (2015)

Calibrating system errors of large scale three-dimensional profile measurement instruments by subaperture stitching method

Zhichao Dong, Haobo Cheng, Yunpeng Feng, Jingshi Su, Hengyu Wu, and Hon-Yuen Tam
Appl. Opt. 54(19) 5962-5969 (2015)