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Virtual Journal for Biomedical Optics

Virtual Journal for Biomedical Optics


  • Editor: Gregory W. Faris
  • Vol. 1, Iss. 11 — Nov. 13, 2006

Developments in realistic design for aperiodic Mo/Si multilayer mirrors

A.L. Aquila, F. Salmassi, F. Dollar, Y. Liu, and E.M. Gullikson  »View Author Affiliations

Optics Express, Vol. 14, Issue 21, pp. 10073-10078 (2006)

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Aperiodic multilayers have been designed for various applications, using numeric algorithms and analytical solutions, for many years with varying levels of success. This work developed a more realistic model for simulating aperiodic Mo/Si multilayers to be used in these algorithms by including the formation of MoSi2. Using a genetic computer code we were able to optimize a 45° multilayer for a large bandpass reflection multilayer that gave good agreement with the model.

© 2006 Optical Society of America

OCIS Codes
(260.7200) Physical optics : Ultraviolet, extreme
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Thin Films

Original Manuscript: April 25, 2006
Revised Manuscript: June 7, 2006
Manuscript Accepted: June 8, 2006
Published: October 16, 2006

Virtual Issues
Vol. 1, Iss. 11 Virtual Journal for Biomedical Optics

A. L. Aquila, F. Salmassi, F. Dollar, Y. Liu, and E. Gullikson, "Developments in realistic design for aperiodic Mo/Si multilayer mirrors," Opt. Express 14, 10073-10078 (2006)

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  1. Z. Wang and A. G. Michette, "Broadband multilayer mirrors for optimum use of soft x-ray source output," J. Opt. A: Pure Appl. Opt. 2,452-457 (2000). [CrossRef]
  2. S. Yulin, T. Kuhlmann, T. Feigl, and N. Kaiser, "Spectral reflectance tuning of EUV mirrors for metrology applications," in Emerging Lithographic Technologies VII, R.L. Engelstad ed., Proc. SPIE 5037,286-293 (2003). [CrossRef]
  3. S. Bajt, D. Stearns, and P. Kearney, "Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers," J. Appl. Phys. 90, 1017-1025 (2001). [CrossRef]
  4. R. S. Rosen, D. G. Stearns, M. A. Viliardos, M. E. Kassner, S. P. Vernon, and Y. Cheng. "Silicide layer growth rates in Mo/Si multilayers," Appl. Opt. 32, 6975-6980 (1993). [CrossRef] [PubMed]
  5. Similar to work done by: P. D. Binda, and F. E. Zocchi, "Genetic algorithm optimization of X-ray multilayer coatings," in Advances in Computational Methods for X-Ray and Neutron Optics, M. Sanchez del Rio, ed., Proc. SPIE 5536, 97-108 (2004). [CrossRef]
  6. B. Liao and R. Luus, "Comparison of the Luus-Jaakola optimization procedure and the genetic algorithm," Eng. Optimiz. 37, 381-398 (2005) [CrossRef]
  7. I. V. Kozhevnikov, I. N. Bukreeva, and E. Ziegler, "Design of X-ray supermirrors," Nucl. Instrum. Methods Phys. Res. A 460, 424-443 (2001). [CrossRef]
  8. E. Spiller, "Interference in thin films: theory," in Soft X-ray Optics (SPIE Optical Engineering Press, 1994), pp. 101-107.
  9. E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, "Recent developments in EUV reflectometry at the Advanced Light Source," in Emerging Lithographic Technologies V, E. A. Dobisz ed., Proc. SPIE 4343, 363 (2001). [CrossRef]

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Fig. 1. Fig. 2. Fig. 3.

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