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Virtual Journal for Biomedical Optics

Virtual Journal for Biomedical Optics

| EXPLORING THE INTERFACE OF LIGHT AND BIOMEDICINE

  • Editor: Gregory W. Faris
  • Vol. 3, Iss. 4 — Apr. 23, 2008

Metrology of optically-unresolved features using interferometric surface profiling and RCWA modeling

Peter de Groot, Xavier Colonna de Lega, Jan Liesener, and Michael Darwin  »View Author Affiliations


Optics Express, Vol. 16, Issue 6, pp. 3970-3975 (2008)
http://dx.doi.org/10.1364/OE.16.003970


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Abstract

Rigorous coupled wave analysis (RCWA) interprets 3D white-light interference microscopy profiles and reveals the dimensions of optically-unresolved surface features. Measurements of silicon etch depth of a 450-nm pitch grating structure correlate to atomic force microscopy with R2 = 0.995 and a repeatability of 0.11nm. This same technique achieves a <1nm sensitivity to 80-nm lateral widths of 190-nm pitch gratings using a 570-nm mean wavelength.

© 2008 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(180.6900) Microscopy : Three-dimensional microscopy

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: January 22, 2008
Revised Manuscript: March 3, 2008
Manuscript Accepted: March 3, 2008
Published: March 10, 2008

Virtual Issues
Vol. 3, Iss. 4 Virtual Journal for Biomedical Optics

Citation
Peter De Groot, Xavier Colonna de Lega, Jan Liesener, and Michael Darwin, "Metrology of optically-unresolved features using interferometric surface profiling and RCWA modeling," Opt. Express 16, 3970-3975 (2008)
http://www.opticsinfobase.org/vjbo/abstract.cfm?URI=oe-16-6-3970


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References

  1. P. de Groot and L. Deck, "Surface profiling by analysis of white-light interferograms in the spatial frequency domain," J. Mod. Opt. 42, 389-401 (1995). [CrossRef]
  2. M. G. Moharam and T. K. Gaylord, "Diffraction analysis of dielectric surface-relief gratings," J. Opt. Soc. Am. 72, 1385-1392, (1982). [CrossRef]
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  4. C. J. Raymond, "Scatterometry for Semiconductor Metrology," in Handbook of Silicon Semiconductor Metrology, A. J. Deibold, ed., (Marcel Dekker, Inc., New York, 2001) [CrossRef]
  5. A. Tavrov, J. Schmit, N. Kerwien, W. Osten, and H. Tiziani, "Diffraction-induced coherence levels," Appl. Opt. 44, 2202-2212 (2005) [CrossRef] [PubMed]
  6. M. Totzeck, "Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields," Optik 112 (2001) 381-390 [CrossRef]
  7. P. de Groot, R. Stoner, and X. Colonna De Lega, "Profiling complex surface structures using height scanning interferometry," US Patent No. 7,151,607 (2006).

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