Low loss high index contrast nanoimprinted polysiloxane waveguides
Optics Express, Vol. 17, Issue 4, pp. 2623-2630 (2009)
http://dx.doi.org/10.1364/OE.17.002623
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Abstract
Nanoimprint lithography is gaining rapid acceptance in fields as diverse as microelectronics and microfluidics due to its simplicity high resolution and low cost. These properties are critically important for the fabrication of photonic devices, where cost is often the major inhibiting deployment factor for high volume applications. We report here on the use of nanoimprint technology to fabricate low loss broadband high index contrast waveguides in a Polysiloxane polymer system for the first time.
© 2009 Optical Society of America
OCIS Codes
(160.5470) Materials : Polymers
(130.5460) Integrated optics : Polymer waveguides
ToC Category:
Integrated Optics
History
Original Manuscript: December 19, 2008
Revised Manuscript: February 1, 2009
Manuscript Accepted: February 2, 2009
Published: February 9, 2009
Virtual Issues
Vol. 4, Iss. 4 Virtual Journal for Biomedical Optics
Citation
Ting Han, Steve Madden, Mathew Zhang, Robbie Charters, and Barry Luther-Davies, "Low loss high index contrast nanoimprinted polysiloxane waveguides," Opt. Express 17, 2623-2630 (2009)
http://www.opticsinfobase.org/vjbo/abstract.cfm?URI=oe-17-4-2623
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