Sidelobe reduction of tightly focused radially higher-order Laguerre-Gaussian beams using annular masks
Optics Letters, Vol. 33, Issue 6, pp. 617-619 (2008)
http://dx.doi.org/10.1364/OL.33.000617
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Abstract
We report the reduction of sidelobes in tight focusing patterns of radially higher-order Laguerre–Gaussian (LG) beams with nonhelical phase structures. Numerical calculations based on the vectorial Debye theory reveal that a class of annular masks reduces sidelobes in the tight focusing patterns only for radially even-order LG beams. The present scheme produces small focal spots beyond the diffraction limit suitable for application to scanning microscopy, laser fine processing, etc.
© 2008 Optical Society of America
OCIS Codes
(110.1220) Imaging systems : Apertures
(110.2990) Imaging systems : Image formation theory
(140.3300) Lasers and laser optics : Laser beam shaping
(260.3160) Physical optics : Interference
ToC Category:
Imaging Systems
History
Original Manuscript: October 5, 2007
Revised Manuscript: December 18, 2007
Manuscript Accepted: February 14, 2008
Published: March 14, 2008
Virtual Issues
Vol. 3, Iss. 4 Virtual Journal for Biomedical Optics
Citation
Yoshiyuki Ohtake, Taro Ando, Takashi Inoue, Naoya Matsumoto, and Haruyoshi Toyoda, "Sidelobe reduction of tightly focused radially higher-order Laguerre-Gaussian beams using annular masks," Opt. Lett. 33, 617-619 (2008)
http://www.opticsinfobase.org/vjbo/abstract.cfm?URI=ol-33-6-617
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