High-throughput three-dimensional lithographic microfabrication
Optics Letters, Vol. 35, Issue 10, pp. 1602-1604 (2010)
http://dx.doi.org/10.1364/OL.35.001602
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Abstract
A 3D lithographic microfabrication process has been developed that is high throughput, scalable, and capable of producing arbitrary patterns. It offers the possibility for industrial scale manufacturing of 3D microdevices such as photonic crystals, tissue engineering scaffolds, and microfluidics chips. This method is based on depth-resolved wide-field illumination by temporally focusing femtosecond light pulses. We characterized the axial resolution of this technique, and the result is consistent with the theoretical prediction. As proof-of-concept experiments, we demonstrated photobleaching of 3D resolved patterns in a fluorescent medium and fabricating 3D microstructures with SU-8 photoresist.
© 2010 Optical Society of America
OCIS Codes
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(190.4180) Nonlinear optics : Multiphoton processes
(230.4000) Optical devices : Microstructure fabrication
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: January 4, 2010
Revised Manuscript: March 23, 2010
Manuscript Accepted: March 29, 2010
Published: May 6, 2010
Virtual Issues
Vol. 5, Iss. 10 Virtual Journal for Biomedical Optics
Citation
Daekeun Kim and Peter T. C. So, "High-throughput three-dimensional lithographic microfabrication," Opt. Lett. 35, 1602-1604 (2010)
http://www.opticsinfobase.org/vjbo/abstract.cfm?URI=ol-35-10-1602
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