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Multiple wavelength reflectance microscopy to study the multiphysical behavior of microelectromechanical systems |
Optics Letters, Vol. 36, Issue 4, pp. 594-596 (2011)
http://dx.doi.org/10.1364/OL.36.000594
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Abstract
In order to characterize surface chemomechanical phenomena driving microelectromechanical systems behavior, we propose herein a method to simultaneously obtain a full kinematic field describing the surface displacement and a map of its chemical modification from optical measurements. Using a microscope, reflected intensity fields are recorded for two different illumination wavelengths. Decoupling the wavelength-independent and -dependent contributions to the measured relative intensity changes then yields the sought fields. This method is applied to the investigation of the electroelastic coupling, providing images of both the local surface electrical charge density and the device deformation field.
© 2011 Optical Society of America
OCIS Codes
(110.0180) Imaging systems : Microscopy
(120.3930) Instrumentation, measurement, and metrology : Metrological instrumentation
(310.4925) Thin films : Other properties (stress, chemical, etc.)
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: November 5, 2010
Revised Manuscript: January 10, 2011
Manuscript Accepted: January 12, 2011
Published: February 15, 2011
Virtual Issues
Vol. 6, Iss. 3 Virtual Journal for Biomedical Optics
Citation
N. Garraud, Y. Fedala, F. Kanoufi, G. Tessier, J. P. Roger, and F. Amiot, "Multiple wavelength reflectance microscopy to study the multiphysical behavior of microelectromechanical systems," Opt. Lett. 36, 594-596 (2011)
http://www.opticsinfobase.org/vjbo/abstract.cfm?URI=ol-36-4-594
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