Abstract
A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, ) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of out-of-band radiation in EUV lithography.
©2012 Optical Society of America
Full Article | PDF ArticleMore Like This
W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine
Opt. Lett. 34(23) 3680-3682 (2009)
Qiushi Huang, Daniel Mathijs Paardekooper, Erwin Zoethout, V. V. Medvedev, Robbert van de Kruijs, Jeroen Bosgra, Eric Louis, and Fred Bijkerk
Opt. Lett. 39(5) 1185-1188 (2014)
V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk
Opt. Lett. 37(7) 1169-1171 (2012)