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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 15 — May. 20, 2012
  • pp: 2865–2869

Influence of ion assistance on LaF3 films deposited by molybdenum boat evaporation

Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano  »View Author Affiliations

Applied Optics, Vol. 51, Issue 15, pp. 2865-2869 (2012)

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LaF3 thin films at 193 nm were deposited by the molybdenum boat evaporation with ion-assisted deposition (IAD). Various optical characteristics, stress, and microstructures that formed under different ion-beam voltages of IAD deposition were investigated. The relation between these properties is also discussed. LaF3 films deposited with IAD exhibited small rough surfaces and large optical loss at 193 nm. The largest value of optical loss for films at 193 nm, which were prepared at an ion-beam voltage of 400 V, was 1.55% and the extinction coefficient was smaller than 0.0015. Microstructures and crystalline structures of films were influenced and changed by the ion-assisted deposition process. Tensile stress value of films increased as the ion-beam voltage rose. Refractive index, related to the packing density and microstructures, also increased as the ion-beam voltage rose.

© 2012 Optical Society of America

OCIS Codes
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

ToC Category:
Thin Films

Original Manuscript: January 20, 2012
Revised Manuscript: March 13, 2012
Manuscript Accepted: March 14, 2012
Published: May 15, 2012

Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano, "Influence of ion assistance on LaF3 films deposited by molybdenum boat evaporation," Appl. Opt. 51, 2865-2869 (2012)

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  1. M. Zukic, D. G. Torr, J. F. Spann, and M. R. Torr, “Vacuum ultraviolet thin films. 1: optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2 and SiO2 thin films,” Appl. Opt. 29, 4284–4292 (1990). [CrossRef]
  2. F. Rainer, W. H. Lowdermilk, D. Milam, C. K. Carniglia, T. T. Hart, and T. L. Lichtenstein, “Materials for optical coatings in the ultraviolet,” Appl. Opt. 24, 496–500 (1985). [CrossRef]
  3. D. Smith and P. Baumeister, “Refractive index of some oxide and fluoride coating materials,” Appl. Opt. 18, 111–115 (1979). [CrossRef]
  4. O. R. Wood, H. G. Craighead, J. E. Sweeney, and P. J. Maloney, “Vacuum ultraviolet loss in magnesium fluoride films,” Appl. Opt. 23, 3644–3649 (1984). [CrossRef]
  5. Y. Uchida, R. Kato, and E. Matsui, “Optical properties of some solids in the vacuum ultraviolet,” J. Quant. Spectrosc. Radiat. Transfer 2, 589–598 (1962). [CrossRef]
  6. W. Hayes, Crystals with the Fluorite Structure (Oxford University, 1974), chap. 1.
  7. D. Ristau, S. Günster, S. Bosch, A. Duparré, E. Masetti, J. Ferré-Borrull, G. Kiriakidis, F. Peirò, E. Quesnel, and A. Tikhonravov, “Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation,” Appl. Opt. 41, 3196–3204 (2002). [CrossRef]
  8. J. G. Cook, G. H. Yousefi, S. R. Das, and D. F. Mitchell, “R.F. magnetron deposition of calcium fluoride,” Thin Solid Films 217, 87–90 (1992). [CrossRef]
  9. M. C. Liu, C. C. Lee, M. Kaneko, K. Nakahira, and Y. Takano, “Microstructure related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm,” Thin Solid Films 492, 45–51 (2005). [CrossRef]
  10. C. C. Lee, M. C. Liu, M. Kaneko, K. Nakahira, and Y. Takano, “Influence of thermal annealing and ultraviolet light irradiation on LaF3 thin films at 193 nm,” Appl. Opt. 44, 6921–6926 (2005). [CrossRef]
  11. M. C. Liu, C. C. Lee, M. Kaneko, K. Nakahira, and Y. Takano, “Microstructure- and composition-related characteristics of LaF3 thin films at 193 nm,” Opt. Eng. 45, 083801 (2006). [CrossRef]
  12. P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, and W. G. Sainty, “Ion-beam-assisted deposition of thin films,” Appl. Opt. 22, 179–185 (1983). [CrossRef]
  13. J. R. McNeil, A. C. Barron, S. R. Wilson, and W. C. Herrmann, “Ion-assisted deposition of optical thin films: low energy vs high energy bombardment,” Appl. Opt. 23, 552–559 (1984). [CrossRef]
  14. J. R. McNeil, G. A. Al-Jumaily, K. C. Jungling, and A. C. Barron, “Properties of TiO2 and SiO2 thin films deposited using ion assisted deposition,” Appl. Opt. 24, 486–489(1985). [CrossRef]
  15. Q. Tang, K. Kikuchi, S. Ogura, and H. A. Macleod, “Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition,” J. Vac. Sci. Technol. A17, 1–6 (1999). [CrossRef]
  16. C. C. Jaing, M. H. Shiao, C. C. Lee, C. J. Lu, M. C. Liu, C. H. Lee, and H. C. Chen, “Effects of ion assistance and substrate temperature on optical characteristics and microstructure of MgF2 films formed by electron-beam evaporation,” J. Appl. Phys. 45, 5027–5029 (2006). [CrossRef]
  17. J. D. Targove, J. P. Lehan, L. J. Lingg, H. A. Macleod, J. A. Leavitt, and L. C. Mclntyre, “Ion-assisted deposition of lanthanum fluoride thin films,” Appl. Opt. 26, 3733–3737 (1987). [CrossRef]
  18. P. J. Martin, W. G. Sainty, R. P. Netterfield, D. R. Mckenzie, D. J. H. Cockayne, S. H. Sie, O. R. Wood, and H. G. Craighead, “Influence of ion assistance on the optical properties of MgF2,” Appl. Opt. 26, 1235–1239 (1987). [CrossRef]
  19. P. J. Martin and R. P. Netterfield, “Ion assisted deposition of magnesium fluoride films on substrates at ambient temperature,” Appl. Opt. 24, 1732–1733 (1985). [CrossRef]
  20. O. Paredes, C. Córdoba, and J. Benavides, “Optical constants determination in thin films lead-free vitreous coatings,” Superficies Vacio 9, 89–91 (1999).
  21. B. A. Movchan and A. V. Demchishin, “Study of the structure and properties of the vacuum condensates of nickel, titanium, tungsten, aluminum oxide, and zirconium dioxide,” Phys. Met. Metallogr. 28, 653–660 (1969).
  22. J. A. Thornton, “Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings,” J. Vac. Sci. Technol. 11, 666–670(1974). [CrossRef]
  23. U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, “Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates,” Thin Solid Films 280, 5–15 (1996). [CrossRef]

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