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Journal of the Optical Society of America B

Journal of the Optical Society of America B


  • Editor: Grover Swartzlander
  • Vol. 30, Iss. 1 — Jan. 1, 2013
  • pp: 229–232

Function of a surface plasmon cavity for enhancing ultradeep subwavelength photolithography

Xu-feng Li, Xia Zhang, Ying-nan Guo, Ji-ke Meng, and Ji-lin Wei  »View Author Affiliations

JOSA B, Vol. 30, Issue 1, pp. 229-232 (2013)

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A surface plasmon resonant cavity capable of enhancing ultradeep subwavelength photolithography in a large area is proposed. The cavity consists of two metal films: one is etched with periodic grooves for exciting surface plasmon resonance at the metal/dielectric interface; the other below is separated by a photoresist layer. Numerical simulations show that the properties of photolithographic patterns in the cavity can be modulated by the depth of the cavity; the physical image behind the modulation is confirmed by the phase regulation of gap surface plasmons in such a system.

© 2012 Optical Society of America

OCIS Codes
(240.6680) Optics at surfaces : Surface plasmons
(110.4235) Imaging systems : Nanolithography
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Optical Design and Fabrication

Original Manuscript: September 14, 2012
Revised Manuscript: October 22, 2012
Manuscript Accepted: November 28, 2012
Published: December 21, 2012

Xu-feng Li, Xia Zhang, Ying-nan Guo, Ji-ke Meng, and Ji-lin Wei, "Function of a surface plasmon cavity for enhancing ultradeep subwavelength photolithography," J. Opt. Soc. Am. B 30, 229-232 (2013)

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